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Поиск книг, содержащих: ion implantation
| Книга | Страницы для поиска | | Wolf E.L. — Nanophysics and nanotechnology. An introduction to modern concepts in nanoscience | | | Williams B.W. — Power Electronics | 4, 6 | | Elliott R.J., Gibson A.F. — An Introduction to Solid State Physics and Its Applications | 162 | | Kwok K.Ng. — Complete guide to semiconductor devices | 13, 623, 624, 625 | | Czanderna, Madey, Powell — Beam Effects, Surface Topography, and Depth Profiling in Surface Analysis (Methods of Surface Characterization) | see “Sputter depth profiling, trapping gases in” | | Cleland A.N. — Foundations of nanomechanics | 390 | | Lieberman M.A., Lichtenberg A.J. — Principles of Plasma Discharges and Materials Processing | see “Plasma-immersion ion implantation” | | Wolf E.L. — Nanophysics and nanotechnology: an introduction to modern concepts in nanoscience | 126, 128 | | Streetman B.G. — Solid State Electronic Devices | 136—138, 319, 323 | | Gao W., Sammes N. — An Introduction to Electronic and Ionic Materials | 84 | | Rossnagel S.M., Cuomo J.J., Westwood W.D. — Handbook of plasma processing technology. Fundamentals, etching, deposition, and surface interaction | 492 | | Martin K. — Digital Integrated Circuit Design | 38, 44 | | Kirk R. E. (ed.), Othmer D. F. (ed.) — Kirk-Othmer Encyclopedia of Chemical Technology. Volume 14 | 390 | | Mccolm I.J. — Ceramic Hardness | 126—127 | | Zallen R. — The Physics of Amorphous Solids | 273, 274 | | McGuire J.H. — Electron correlation dynamics in atomic collisions | 84 | | Sedra A.S., Smith K.C. — Microelectronic circuits | A3—A4 | | Lilley J.S. — Nuclear physics: principles and applications | 208 | | Plummer J.D., Deal M.D., Griffin P.B. — Silicon VLSI Technology: Fundamentals, Practice, and Modeling | 15—17, 60, 61, 190, 346, 375, 451—508 |
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