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Àâòîðèçàöèÿ |
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Ïîèñê ïî óêàçàòåëÿì |
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Riviere J.C. (ed.), Myhra S. (ed.) — Handbook of Surface and Interface Analysis |
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Ïðåäìåòíûé óêàçàòåëü |
SEM, Monel 400 675—676 687 694
SEM, pitted corrosion surface 654 656
SEM, Roman lead pipe 840 847
SEM, Roman leaded bronzes 864—865
SEM, spatial resolution 548—549 653—654
SFM, calibration, aspect ratio 426 433—434 439
SFM, calibration, coefficient of friction 431
SFM, calibration, correction factors 428
SFM, calibration, lateral spring constant 429 431—433
SFM, calibration, material 427
SFM, calibration, normal spring constant 428 131
SFM, calibration, precision 431
SFM, calibration, radius of curvature 434 439
SFM, calibration, reference surfaces 438—439
SFM, calibration, resonance frequency 433
SFM, calibration, reverse imaging 433—434
SFM, calibration, standard lever 430
SFM, calibration, tip height 439—440
SFM, calibration, tip tilt 440—441
SFM, force relationships 407 409
SFM, force relationships, probes 425—440
SFM, force relationships, probes, commercial product 425
SFM, force relationships, probes, material 427 433 134
SFM, force relationships, probes, radius of curvature 427 434—439
SFM, force relationships, probes, SEM image 425
SFM, spatial resolution 401—402
SFM, subgroups 400
Shake-up features, XPS, C 1s, 85—87 336 805
Shake-up features, XPS, Ceria 169—170
Shake-up features, XPS, Cu, CuO, 169 761
Shake-up features, XPS, Fe to Cu 169 761
Shake-up features, XPS, use in catalysis 761
Si, Auger parameter 331 512—513 516 585—587 760
Si, in 331
Si, in Cr — O — Si cermet 329—332
Si, in suboxides 510—516
Si, LVV chemical shift 489
Si, reconstruction, STM 398—399
SIMS, elemental sensitivity 751
SIMS, matrix effect 211 223 232—233 282—283 458
SIMS, maximum primary ion dose 212
SIMS, molecular emission 211—212
SIMS, preferential sputtering 283
SIMS, quantification, damage problems 212 614
SIMS, secondary ion yield 211 222
SIMS, sensitivity factor 283
SIMS, static (SSIMS) 212—239
SIMS, surface charging 751
SIMS, yield variation problems 282—283 751
Smoothing, spectral 71—72 99
SNMS, angular distribution 222
SNMS, characteristics 43 258—259 285—288
SNMS, disappearance cross-section 221
SNMS, disappearance yield 221
SNMS, energy distribution 222
SNMS, geometrical yield 223
SNMS, ion profiling 250—251 358—359
SNMS, ion sources 215
SNMS, ion sources, 213 215
SNMS, ion sources, electron impact 212—213 215 267
SNMS, ion sources, LMIG 213—215 267
SNMS, mass analyzers 214—215
SNMS, noble metal substrates 224—226
SNMS, operation 285—286
SNMS, post-ionization 211 216—217 221 224 285—286
SNMS, quantification 282—283 287—288
SNMS, spectral interpretation 220—221
Spatial resolution, AES 200 463 465 476 485 501
Spatial resolution, catalyst requirements 750
Spatial resolution, DCEMS 360
Spatial resolution, field emission SEM 548 653—654
Spatial resolution, Raman spectroscopy 740
Spatial resolution, SAM 118 201 463 491 494 525 531 551 606 750 837 864—865
Spatial resolution, SEM 548—549 653—654
Spatial resolution, SPM 401—402
Spatial resolution, SSIMS 227—229 751
Spatial resolution, STEM 709
Spatial resolution, XPS, imaging 90—91 200—201 485 465—466 492 795 797
Spatial resolution, XPS, scanning 89 485 492
SSIMS problem-solving, catalysis 766—769
SSIMS problem-solving, Cl diffusion in polymers 242—243
SSIMS problem-solving, defects in car paint 239—241
SSIMS problem-solving, grain boundaries, ceramics 569 581 583
SSIMS problem-solving, residues on glass 246—249
SSIMS problem-solving, segregation in ceramics 583
SSIMS problem-solving, surface modification 243—246
SSIMS, angular distribution 222
SSIMS, atomic mass definition 230
SSIMS, characteristics 42 258—259
SSIMS, depth profiling 229 251 266 358—359
SSIMS, disappearance cross-section 221
SSIMS, disappearance yield 221
SSIMS, energy distribution 222
SSIMS, ion sources 215
SSIMS, ion sources, 213 215
SSIMS, ion sources, electron impact 212—213 215 267
SSIMS, ion sources, LMIG 213—215 267
SSIMS, mass analyzers 215
SSIMS, mass analyzers, ion cyclotron resonance 214—215
SSIMS, mass analyzers, magnetic sector 214—215
SSIMS, mass analyzers, quadrupole 214—215
SSIMS, mass analyzers, time-of-flight (ToF) 214 215 226 228 766
SSIMS, mass assignment guidelines 230—232 766—767
SSIMS, performance summary 226 249—250
SSIMS, quantification 232—239 282—283
SSIMS, quantification, calibration curve 234
SSIMS, quantification, choice of standard 235
SSIMS, quantification, internal standards 233—235
SSIMS, quantification, matrix effect 211 223 232—233 282—283 751
SSIMS, quantification, noble metal substrates 224—226
SSIMS, quantification, normalization to substrate 236
SSIMS, quantification, organic monolayer 233
SSIMS, quantification, organic multilayers 237—238
SSIMS, quantification, secondary ion yield 222 233
SSIMS, spatial resolution 227—229 751
SSIMS, spectra databases 766
SSIMS, spectral interpretation 217 219—220
SSIMS, surface charge compensation 216 751
SSIMS, surface specificity 246 249 751 766—768
SSIMS, typical spectrum 217—219
Stable isotopes 887—892
Standardisation progress in surface analysis 906—926
STEM, characteristics 42
STEM, spatial resolution 709
STEM, tribology 709
STM, characteristics 43 401
STM, depth resolution 401 402 404
STM, electron tunnelling 402—406
STM, energy level scheme 403
STM, information 401 546—547 712 725
STM, instrumentation 410—421
STM, physical principles 402 406
STM, spatial resolution 404
STM, surface specificity 416
STM, tip condition 417
STM, tunnel voltage 404—405
STM, work function mapping 405
STS, characteristics 43 402—406
STS, complement to UPS/IPES 405
STS, information 401
STS, physical principles 402—406
STS, valence and conduction state mapping 405
Stylus profilometry, measurement of crater depth 269
Surface charging 70 98—99 172 313 492 493 516 571 589 616—618 750—751 758
Synchrotron radiation photoelectron spectroscopy (SRPS) 486
Synchrotron radiation photoelectron spectroscopy (SRPS), angular and energy resolution 885 887
Synchrotron radiation photoelectron spectroscopy (SRPS), characteristics 40 488
Synchrotron radiation photoelectron spectroscopy (SRPS), DOS mapping 486
Synchrotron radiation photoelectron spectroscopy (SRPS), semiconductors and microelectronics 486
Synchrotron radiation photoelectron spectroscopy (SRPS), sources 489
| Synchrotron radiation photoelectron spectroscopy (SRPS), spatial resolution 492
Synchrotron radiation photoelectron spectroscopy (SRPS), surface specificity 487 488 513
Synchrotron radiation photoelectron spectroscopy (SRPS), tuning of photon energy 519
Synchrotron radiation photoelectron spectroscopy (SRPS), vacuum requirements 885
Taper section, for depth profiling 202 494 650—651 810—811
TEM, characteristic’s 41
TEM, grain boundary analysis 450 471 473—477
TEM, high resolution (HRTEM) 360
TEM, implanted layers 359—360
TEM, information 546—547
TEM, phase structure 556—557 578
TEM, tribology 707—709 729
Ti, 2p doublet, BEs 323
Ti, in TiN, 2p peaks 316—320 323—324
Ti, in TiN, effects of ion bombardment 315—320
Ti, in TiN, oxynitride phase 324
Ti, in TiN, valence state variation 314
TiN, coating material 314
TiN, effect of ion bombardment 315—324
TiN, overlapping Ti doublets 320
TiN, plasma nitriding 320—322
TiN, RBS analysis 315
TiN, substoichiometry 322—323
TiN, superstoichiometry 323—324
TiN, XPS analysis 315
TiN, XPS analysis, peak positions 315—320
TiN, XPS analysis, Ti/N ratios 322
ToF — SIMS, C fibres 788 804
ToF — SIMS, characteristics 43
ToF — SIMS, mass resolution 228
ToF — SIMS, minerals, ceramics, and glasses 551
ToF — SIMS, sensitivity 766
ToF — SIMS, spatial distribution of molecular ions on PbS 571—572
ToF — SIMS, spatial resolution 227—229 570—571
Tribology, analysis 705 724 732—733 738—739
Tribology, analysis, wear particles 705 729—730 736
Tribology, analysis, wear scars 705 736
Tribology, analysis 705—706
Tribology, analysis, 705—706 724 727 729 733 736 742
Tribology, analysis, 706 727—729
Tribology, analysis, adsorbed species 720—724 727—729
Tribology, analysis, clean surfaces 705 723—724
Tribology, analysis, difficulties 706
Tribology, analysis, possible techniques 705—706
Tribology, analysis, wear scars 706 724 736 742
Tribology, analysis 706
Tribology, analysis, 706
Tribology, analysis, 706 714
Tribology, analysis, experimental difficulties 706
Tribology, analysis, instrumentation 711
Tribology, analysis, surfaces in motion 706 709—710 719—720
Tribology, in UHV 732—737
Tribology, in UHV, depth profile 734 735
Tribology, in UHV, AES analysis 736
Tribology, in UHV, AFM analysis 736
Tribology, in UHV, HRTEM analysis of wear particles 736—737
Tribology, in UHV, NRA analysis 734 735
Tribology, in UHV, super-low friction 733
Tribology, analysis modes 704—706
Tribology, analysis modes, 704—705
Tribology, analysis modes, 704—705
Tribology, analysis modes, 704 706
Tribology, analysis modes, 704
Tribology, analysis modes, 704
Tribology, analytical criteria, dimensional 701—703
Tribology, analytical criteria, information 702 706—713
Tribology, analytical criteria, time-scale 701 703—706
Tribology, analytical techniques 707—713
Tribology, antiwear additives 717—722
Tribology, antiwear additives, analysis 720—722
Tribology, antiwear additives, analysis 719—720
Tribology, antiwear additives, AES analysis 720—722
Tribology, antiwear additives, analytical techniques 717
Tribology, antiwear additives, ELNES analysis 718
Tribology, antiwear additives, environment of Fe and Zn atoms in wear debris 717—719
Tribology, antiwear additives, friction tests in vacuo 720—722
Tribology, antiwear additives, XANES analysis 717
Tribology, antiwear additives, XPS analysis 720
Tribology, basic phenomena, adhesion 698—700
Tribology, basic phenomena, asperity deformation 698—700
Tribology, basic phenomena, ploughing 698—700
Tribology, boundary lubrication 698—700 714—716
Tribology, boundary lubrication, measurement of film thickness by UFI 714 716
Tribology, carbonaceous coatings 737—740
Tribology, carbonaceous coatings, diamond-like 737—738
Tribology, carbonaceous coatings, frictional behaviour 739—740
Tribology, carbonaceous coatings, H content dependence 739
Tribology, carbonaceous coatings, super-low friction 739
Tribology, dry friction and adsorbed monolayers 727—729
Tribology, dry friction and adsorbed monolayers, instrumentation 728
Tribology, dry friction and adsorbed monolayers, adsorbates 729
Tribology, dry friction and adsorbed monolayers, AES analysis 727—729
Tribology, dry friction and adsorbed monolayers, effects on friction 728—729
Tribology, gas lubrication of ceramics 729—731
Tribology, gas lubrication of ceramics, AES analysis 729—730
Tribology, gas lubrication of ceramics, effect of 729—730
Tribology, gas lubrication of ceramics, friction in vacuo 729
Tribology, gas lubrication of ceramics, TEM analysis 729
Tribology, information sought 706—713 741
Tribology, information sought, chemical bonds 707 741
Tribology, information sought, chemical phases 707 741
Tribology, information sought, chemical states 707 741
Tribology, information sought, structure 707 741
Tribology, interfaces 712—713
Tribology, interfaces, surface force measurements 713
Tribology, interfaces, very thin lubricating films 713
Tribology, introduction 697—698
Tribology, lubricant additives 699 717—724
Tribology, lubricant film thicknesses 698—700
Tribology, lubrication modes, boundary 698—700 714 716
Tribology, lubrication modes, elastohydrodynamic 698
Tribology, lubrication modes, hydrodynamic 698
Tribology, lubrication modes, mixed 700
Tribology, lubrication modes, solid-film 700
Tribology, microstructure 731—732
Tribology, microstructure, lubricant 731—732
Tribology, microstructure, coatings on steel 732
Tribology, microstructure, layer structure 731
Tribology, nascent surfaces 722—724
Tribology, size distribution of tribological elements 702—703
Tribology, spatial resolution needed 703 706 709 742
Tribology, surface analytical procedure 701—702
Tribology, surface morphology 711—712
Tribology, surface morphology, AFM 712
Tribology, surface morphology, effect on tribological behaviour 711
Tribology, surface morphology, STM 712 725
Tribology, tribochemical reactions at interfaces 724—727
Tribology, tribochemical reactions at interfaces, AES analysis 724—725
Tribology, tribochemical reactions at interfaces, contact materials 724
Tribology, tribochemical reactions at interfaces, friction in vacuo 724—725
Tribology, tribochemical reactions at interfaces, high temperature lubricants 727
Tribology, tribochemical reactions at interfaces, organic lubricants 725—727
Tribology, tribochemical reactions at interfaces, thin oxides in interface 724
Tribology, tribochemical reactions at interfaces, XPS analysis 724 727
Tribology, tribochemistry of 740—741
Tribology, tribochemistry of , Raman analysis 740—741
Tribology, tribochemistry of , thin films 740
TRIM, simulation of depth profiles 312 352—353 387
Ultrathin film interferometry (UFI), characteristics 41
Ultrathin film interferometry (UFI), description 714 716
Ultrathin film interferometry (UFI), measurement of boundary lubricant film thickness 714 716
Ultrathin film interferometry (UFI), sampling depth 714
UPS, angular and energy resolution, SRPS 885 887
UPS, angular and energy resolution, vacuum requirements 885
UPS, angular resolution (ARUPS), adsorbate orientation 887
UPS, angular resolution (ARUPS), band structure mapping 887
UPS, characteristics 40
UPS, comparison with XPS 884 885
UPS, complement to IPES 405
UPS, complement to STS 405
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