The general high-frequency, rough-surface reflection process is treated by the method of stationary phase. In particular, the principle of stationary phase is applied to each of the local reflection events, which appear to depend on surface curvature as well as slope. However, we show that the number of reflecting highlights also depends on curvature and cancels the curvature dependence. These results agree fully with those obtained by Beckmann and Spizzichino for the special case of the Gaussian process.