Plasma processing is one of the key technologies worldwide, especially using nonthermal,
low-temperature plasmas. Recently, the situation is characterized by the
fast-growing interest in the optimization of existing applications as well as the
development of new ones.
This book provides a basic introduction to nonthermal plasma chemistry and
physics for students of plasma physics, PhD students, and scientists. The fundamentals
of plasma chemical reactions and its modeling, most importantly nonthermal
plasma sources, relevant diagnostic techniques, as well as selected applications, are
presented and discussed in a systematic manner. Interconnections are shown; trends
and new concepts are illustrated. The chapters discuss the basic principles and provide
exemplary illustrations of the wide field of applications. Therefore, it is not the
aim of this book to give a complete overview of the state of the art in the research
areas. For this, the readers can refer to already existing excellent monographs and
topical reviews given in the references.