A comprehensive review of the state of the art and advances in the field, while also outlining the future potential and development trends of optical imaging and optical metrology, an area of fast growth with numerous applications in nanotechnology and nanophysics. Written by the world's leading experts in the field, it fills the gap in the current literature by bridging the fields of optical imaging and metrology, and is the only up-to-date resource in terms of fundamental knowledge, basic concepts, methodologies, applications, and development trends.Content:
Chapter 1 LCOS Spatial Light Modulators: Trends and Applications (pages 1–29): Grigory Lazarev, Andreas Hermerschmidt, Sven Kruger and Stefan Osten
Chapter 2 Three?Dimensional Display and Imaging: Status and Prospects (pages 31–56): Byoungho Lee and Youngmin Kim
Chapter 3 Holographic Television: Status and Future (pages 57–94): Malgorzata Kujawinska and Tomasz Kozacki
Chapter 4 Display Holography–Status and Future (pages 95–119): Ventseslav Sainov and Elena Stoykova
Chapter 5 Incoherent Computer?Generated Holography for 3D Color Imaging and Display (pages 121–134): Toyohiko Yatagai and Yusuke Sando
Chapter 6 Approaches to Overcome the Resolution Problem in Incoherent Digital Holography (pages 135–161): Joseph Rosen, Natan T. Shaked, Barak Katz and Gary Brooker
Chapter 7 Managing Digital Holograms and the Numerical Reconstruction Process for Focus Flexibility (pages 163–177): Melania Paturzo and Pietro Ferraro
Chapter 8 Three?Dimensional Particle Control by Holographic Optical Tweezers (pages 179–206): Mike Woerdemann, Christina Alpmann and Cornelia Denz
Chapter 9 The Role of Intellectual Property Protection in Creating Business in Optical Metrology (pages 207–223): Dr. Nadya Reingand
Chapter 10 On the Difference between 3D Imaging and 3D Metrology for Computed Tomography (pages 225–238): Daniel Wei? and Michael Totzeck
Chapter 11 Coherence Holography: Principle and Applications (pages 239–253): Mitsuo Takeda, Wei Wang and Dinesh N. Naik
Chapter 12 Quantitative Optical Microscopy at the Nanoscale: New Developments and Comparisons (pages 255–282): Bernd Bodermann, Egbert Buhr, Zhi Li and Harald Bosse
Chapter 13 Model?Based Optical Metrology (pages 283–304): Xavier Colonna de Lega
Chapter 14 Advanced MEMS Inspection by Direct and Indirect Solution Strategies (pages 305–326): Ryszard J. Pryputniewicz
Chapter 15 Different Ways to Overcome the Resolution Problem in Optical Micro and Nano Metrology (pages 327–368): Prof. Dr. Wolfgang Osten
Chapter 16 Interferometry in Harsh Environments (pages 369–391): Jr. Armando Albertazzi G.
Chapter 17 Advanced Methods for Optical Nondestructive Testing (pages 393–412): Ralf B. Bergmann and Philipp Huke
Chapter 18 Upgrading Holographic Interferometry for Industrial Application by Digital Holography (pages 413–437): Zoltaan Fuzessy, Ferenc Gyimesi and Venczel Borbely