Content: Photophysics, photochemistry, and photo-optical effects in polymer solids / Kazuyuki Horie —
Photochemistry of liquid-crystalline polymers / David Creed, Richard A. Cozad, Anselm C. Griffin, Charles E. Hoyle, Lixin Jin, Petharnan Subramanian, Sangya S. Varma, and Krishnan Venkataram —
Dissociative electron capture of polymers with bridging acid anhydrides : matrix isolation electron spin resonance study / Paul H. Kasai —
Luminescence study of ion-irradiated aromatic polymers / Y. Aoki, H. Namba, F. Hosoi, and S. Nagai —
New directions in the design of chemically amplified resists / E. Reichmanis, M.E. Galvin, K.E. Uhrich, P. Mirau, and S.A. Heffner —
Dual-tone and aqueous base developable negative resists based on acid-catalyzed dehydration / Hiroshi Ito and Yasunari Maekawa —
Importance of donor-acceptor reactions for the photogeneration of acid in chemically amplified resists / Nigel P. Hacker —
Acid generation in chemically amplified resist films / Takeo Watanabe, Yoshio Yamashita, Takahiro Kozawa, Yoichi Yoshida, and Seiichi Tagawa —
Radiation-induced reactions of onium salts in novolak / Takahiro Kozawa, M. Uesaka, Takeo Watanabe, Yoshio Yamashita, H. Shibata, Yoichi Yoshida, and Seiichi Tagawa —
Polymeric sulfonium salts as acid generators for excimer laser lithography / Katsumi Maeda, Kaichiro Nakano, and Etsuo Hasegawa —
Application of triaryl phosphate to photosensitive materials : photoreaction mechanism of triaryl phosphate / I. Naito, A. Kinoshita, Y. Okamoto, and S. Takamuku —
Effect of water on the surface insoluble layer of chemically amplified positive resists / Jiro Nakamura, Hiroshi Ban, Yoshio Kawai, and Akinobu Tanaka —
Thermal properties of a chemically amplified resist resin / Koji Asakawa, Akinori Hongu, Naohiko Oyasato, and Makoto Nakase —
Modeling and simulation of chemically amplified resist systems / Akinori Hongu, Koji Asakawa, Tohru Ushirogouchi, Hiromitsu Wakabayashi, Satoshi Saito, and Makoto Nakase —
Surface imaging using photoinduced acid-catalyzed formation of polysiloxanes at air-polymer interface / Masamitsu Shirai, Tomonobu Sumino, and Masahiro Tsunooka —
Surface imaging for applications to sub-0.35-[micrometer] lithography / Ki-Ho Baik and Luc Van den hove —
Molecular design of epoxy resins for microelectronics packaging / Masashi Kaji —
Uniaxial and in-plane molecular orientation of polyimides and their precursor as studied by absorption dichroism of perylenebisimide dye / M. Hasegawa, T. Matano, Y. Shindo, and T. Sugimura —
Novel photosensitive polyimide precursor based on polyisoimide using nifedipine as a dissolution inhibitor / Amane Mochizuki, Tadashi Teranishi, Mitsuru Ueda, and Toshihiko Omote —
Photochemical behavior of nifedipine derivatives and application to photosensitive polyimides / T. Yamaoka, S. Yokoyama, T. Omote, K. Naitoh, and K. Yoshida —
Waveguiding in high-temperature-stable materials / C. Feger, S. Perutz, R. Reuter, J.E. McGrath, M. Osterfeld, and H. Franke —
Rodlike fluorinated polyimide as an in-plane birefringent optical material / Shinji Ando, Takashi Sawada, and Yasuyuki Inoue —
Preparation of polyphenylene and copolymers for microelectronics applications / N.A. Johnen, H.K. Kim, and C.K. Ober —
Charge-carrier generation and migration in a polydiacetylene compound studied by pulse radiolysis time-resolved microwave conductivity —
G.P. van der Laan, M.P. de Haas, J.M. Warman, D.M. de Leeuw, and J. Tsibouklis —
Excitation dynamics in conjugated polymers / H. Ba?ssler, E.O. Go?bel, A. Greiner, R. Kersting, H. Kurz, U. Lemmer, R.F. Mahrt, and Y. Wada —
Application of polyaniline films to radiation dosimetry / Yuichi Oki, Takenori Suzuki, Taichi Miura, Masaharu Numajiri, and Kenjiro Kondo —
Present and future of fullerenes : C?? and tubules / Katsumi Tanigaki —
Photoresponsive liquid-crystalline polymers : holographic storage, digital storage, and holographic optical components / Klaus Anderle and Joachim H. Wendorff —
Azimuthal alignment photocontrol of liquid crystals / Kunihiro Ichimura —
Electronic structure and UV absorption spectra of permethylated silicon chains / Harald S. Plitt, John W. Downing, Hiroyuki Teramae, Mary Katherine Raymond, and Josef Michl —
Electronic properties of polysilanes / R.G. Kepler and Z.G. Soos —
UV photoelectron spectroscopy of polysilanes and polygermanes / Kazuhiko Seki, Akira Yuyama, Satoru Narioka, Hisao Ishii, Shinji Hasegawa, Hiroaki Isaka, Masaie Fujino, Michiya Fujiki, and Nobuo Matsumoto —
Radical ions of polysilynes / Akira Watanabe, Minoru Matsuda, Yoichi Yoshida, and Seiichi Tagawa —
Optical properties of silicon-based polymers with different backbone structures / Katsunori Suzuki, Yoshihiko Kanemitsu, Soichiro Kyushin, and Hideyuki Matsumoto —
Synthesis and properties of polysilanes prepared by ring-opening polymerization / Eric Fossum and Krzysztof Matyjaszewski —
New synthesis and functionalization of photosensitive poly(silyl ether) by addition reaction of bisepoxide with dichlorosilane / Atsushi Kameyama, Nobuyuki Hayashi, and Tadatomi Nishikubo.