Главная    Ex Libris    Книги    Журналы    Статьи    Серии    Каталог    Wanted    Загрузка    ХудЛит    Справка    Поиск по индексам    Поиск    Форум   
blank
Авторизация

       
blank
Поиск по указателям

blank
blank
blank
Красота
blank
Rizvi S. — Handbook of Photomask Manufacturing Technology
Rizvi S. — Handbook of Photomask Manufacturing Technology

Читать книгу
бесплатно

Скачать книгу с нашего сайта нельзя

Обсудите книгу на научном форуме



Нашли опечатку?
Выделите ее мышкой и нажмите Ctrl+Enter


Название: Handbook of Photomask Manufacturing Technology

Автор: Rizvi S.

Аннотация:

As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available.
The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation.
Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies. — Features — · Provides a multi-dimensional view of photomask technology · Offers a general overview and detailed, in-depth discussions of photomask technology · Builds expertise on design and processing to optimize photomask constraints without sacrificing functionality and specs of the chip · Discusses mask writing, providing detailed treatment of electron beam writers and laser writers · Contains a complete walkthrough of the development process from conception to final testing, including modeling and simulation


Язык: en

Рубрика: Разное/

Статус предметного указателя: Неизвестно

ed2k: ed2k stats

Год издания: 2005

Количество страниц: 878

Добавлена в каталог: 31.01.2016

Операции: Положить на полку | Скопировать ссылку для форума | Скопировать ID
blank
Предметный указатель
blank
Реклама
blank
blank
HR
@Mail.ru
       © Электронная библиотека попечительского совета мехмата МГУ, 2004-2019
Электронная библиотека мехмата МГУ | Valid HTML 4.01! | Valid CSS! О проекте