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Название: Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications
Автор: Schmitz J.E.J.
This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.